Nucleation and Growth of Single Layer Graphene on Supported Cu Catalysts by Cold Wall Chemical Vapor Deposition

Nucleation and Growth of Single Layer Graphene on Supported Cu Catalysts by Cold Wall Chemical Vapor Deposition

abstract: Chemical Vapor Deposition (CVD) is the most widely used method to grow large-scale single layer graphene. However, a systematic experimental study of the relationship between growth parameters and graphene film morphology, especially in the industrially preferred cold wall CVD, has not bee...

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Bibliographic Details
Other Authors: Das, Shantanu (Author)
Format: Doctoral Thesis
Language:English
Published: 2018
Subjects:
Materials Science
Condensed matter physics
Nanoscience
Cold Wall Chemical Vapor Deposition
Experimental Physics
Graphene
Growth Mechanism
Nucleation Density
Two Dimensional Material
Online Access:http://hdl.handle.net/2286/R.I.50114

Internet

http://hdl.handle.net/2286/R.I.50114

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