Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors

abstract: A dual chamber molecular beam epitaxy (MBE) system was rebuilt for the growth of 6.1 Angstrom II-VI and III-V compound semiconductor materials that are to be used in novel optoelectronic devices that take advantage of the nearly continuous bandgap availability between 0 eV and 3.4 eV. Thes...

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Other Authors: Dettlaff, William Henry Gerald (Author)
Format: Dissertation
Language:English
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/2286/R.I.14897
id ndltd-asu.edu-item-14897
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spelling ndltd-asu.edu-item-148972018-06-22T03:02:56Z Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors abstract: A dual chamber molecular beam epitaxy (MBE) system was rebuilt for the growth of 6.1 Angstrom II-VI and III-V compound semiconductor materials that are to be used in novel optoelectronic devices that take advantage of the nearly continuous bandgap availability between 0 eV and 3.4 eV. These devices include multijunction solar cells and multicolor detectors. The MBE system upgrade involved the conversion of a former III-V chamber for II-VI growth. This required intensive cleaning of the chamber and components to prevent contamination. Special features including valved II-VI sources and the addition of a cold trap allowed for the full system to be baked to 200 degrees Celsius to improve vacuum conditions and reduce background impurity concentrations in epilayers. After the conversion, the system was carefully calibrated and optimized for the growth of ZnSe and ZnTe on GaAs (001) substrates. Material quality was assessed using X-ray diffraction rocking curves. ZnSe layers displayed a trend of improving quality with decreasing growth temperature reaching a minimum full-width half-maximum (FWHM) of 113 arcsec at 278 degrees Celsius. ZnTe epilayer quality increased with growth temperature under Zn rich conditions attaining a FWHM of 84 arcsec at 440 degrees Celsius. RHEED oscillations were successfully observed and used to obtain growth rate in situ for varying flux and temperature levels. For a fixed flux ratio, growth rate decreased with growth temperature as the desorption rate increased. A directly proportional dependence of growth rate on Te flux was observed for Zn rich growth. Furthermore, a method for determining the flux ratio necessary for attaining the stoichiometric condition was demonstrated. Dissertation/Thesis Dettlaff, William Henry Gerald (Author) Zhang, Yong-Hang (Advisor) Vasileska, Dragica (Committee member) Johnson, Shane (Committee member) Arizona State University (Publisher) Electrical engineering III-V Semiconductors II-VI Semiconductors Molecular Beam Epitaxy RHEED Oscillations ZnSe ZnTe eng 86 pages M.S. Electrical Engineering 2012 Masters Thesis http://hdl.handle.net/2286/R.I.14897 http://rightsstatements.org/vocab/InC/1.0/ All Rights Reserved 2012
collection NDLTD
language English
format Dissertation
sources NDLTD
topic Electrical engineering
III-V Semiconductors
II-VI Semiconductors
Molecular Beam Epitaxy
RHEED Oscillations
ZnSe
ZnTe
spellingShingle Electrical engineering
III-V Semiconductors
II-VI Semiconductors
Molecular Beam Epitaxy
RHEED Oscillations
ZnSe
ZnTe
Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors
description abstract: A dual chamber molecular beam epitaxy (MBE) system was rebuilt for the growth of 6.1 Angstrom II-VI and III-V compound semiconductor materials that are to be used in novel optoelectronic devices that take advantage of the nearly continuous bandgap availability between 0 eV and 3.4 eV. These devices include multijunction solar cells and multicolor detectors. The MBE system upgrade involved the conversion of a former III-V chamber for II-VI growth. This required intensive cleaning of the chamber and components to prevent contamination. Special features including valved II-VI sources and the addition of a cold trap allowed for the full system to be baked to 200 degrees Celsius to improve vacuum conditions and reduce background impurity concentrations in epilayers. After the conversion, the system was carefully calibrated and optimized for the growth of ZnSe and ZnTe on GaAs (001) substrates. Material quality was assessed using X-ray diffraction rocking curves. ZnSe layers displayed a trend of improving quality with decreasing growth temperature reaching a minimum full-width half-maximum (FWHM) of 113 arcsec at 278 degrees Celsius. ZnTe epilayer quality increased with growth temperature under Zn rich conditions attaining a FWHM of 84 arcsec at 440 degrees Celsius. RHEED oscillations were successfully observed and used to obtain growth rate in situ for varying flux and temperature levels. For a fixed flux ratio, growth rate decreased with growth temperature as the desorption rate increased. A directly proportional dependence of growth rate on Te flux was observed for Zn rich growth. Furthermore, a method for determining the flux ratio necessary for attaining the stoichiometric condition was demonstrated. === Dissertation/Thesis === M.S. Electrical Engineering 2012
author2 Dettlaff, William Henry Gerald (Author)
author_facet Dettlaff, William Henry Gerald (Author)
title Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors
title_short Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors
title_full Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors
title_fullStr Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors
title_full_unstemmed Conversion of a Molecular Beam Epitaxy System for the Growth of 6.1 Angstrom Semiconductors
title_sort conversion of a molecular beam epitaxy system for the growth of 6.1 angstrom semiconductors
publishDate 2012
url http://hdl.handle.net/2286/R.I.14897
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