Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes

Two-photon absorption (TPA) has become an important tool for understanding the mechanisms of single-event effects (SEE) in microelectronics. Very little experimental work has been reported that describes the physical structure of the charge cloud centered on the focal plane where TPA carrier generat...

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Main Author: Hooten, Nicholas C
Other Authors: Ronald Schrimpf
Format: Others
Language:en
Published: VANDERBILT 2011
Subjects:
Online Access:http://etd.library.vanderbilt.edu/available/etd-07222011-143800/
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spelling ndltd-VANDERBILT-oai-VANDERBILTETD-etd-07222011-1438002013-01-08T17:16:50Z Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes Hooten, Nicholas C Electrical Engineering Two-photon absorption (TPA) has become an important tool for understanding the mechanisms of single-event effects (SEE) in microelectronics. Very little experimental work has been reported that describes the physical structure of the charge cloud centered on the focal plane where TPA carrier generation is likely to occur (the "TPA region"). A detailed study of the TPA region would provide valuable insight into the use of TPA as an SEE testing method in general. This work reports measurements of the spatial extent of the TPA region in the direction of beam propagation in silicon diodes. Experimental results indicate that the waist diameter of the beam can have a significant impact on the spatial qualities of the TPA region and that in some circumstances, peak charge collection occurs when the focal plane of the laser is several micrometers below the junction. The implications that these results could have for TPA SEE laser testing will also be discussed. A simple analytical model for TPA in a semiconductor is implemented using device level simulations. Results indicate that while the simple model is adequate for describing qualitative trends, it is not suitable for quantitative studies. Ronald Schrimpf Robert Reed VANDERBILT 2011-08-03 text application/pdf http://etd.library.vanderbilt.edu/available/etd-07222011-143800/ http://etd.library.vanderbilt.edu/available/etd-07222011-143800/ en unrestricted I hereby certify that, if appropriate, I have obtained and attached hereto a written permission statement from the owner(s) of each third party copyrighted matter to be included in my thesis, dissertation, or project report, allowing distribution as specified below. I certify that the version I submitted is the same as that approved by my advisory committee. I hereby grant to Vanderbilt University or its agents the non-exclusive license to archive and make accessible, under the conditions specified below, my thesis, dissertation, or project report in whole or in part in all forms of media, now or hereafter known. I retain all other ownership rights to the copyright of the thesis, dissertation or project report. I also retain the right to use in future works (such as articles or books) all or part of this thesis, dissertation, or project report.
collection NDLTD
language en
format Others
sources NDLTD
topic Electrical Engineering
spellingShingle Electrical Engineering
Hooten, Nicholas C
Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes
description Two-photon absorption (TPA) has become an important tool for understanding the mechanisms of single-event effects (SEE) in microelectronics. Very little experimental work has been reported that describes the physical structure of the charge cloud centered on the focal plane where TPA carrier generation is likely to occur (the "TPA region"). A detailed study of the TPA region would provide valuable insight into the use of TPA as an SEE testing method in general. This work reports measurements of the spatial extent of the TPA region in the direction of beam propagation in silicon diodes. Experimental results indicate that the waist diameter of the beam can have a significant impact on the spatial qualities of the TPA region and that in some circumstances, peak charge collection occurs when the focal plane of the laser is several micrometers below the junction. The implications that these results could have for TPA SEE laser testing will also be discussed. A simple analytical model for TPA in a semiconductor is implemented using device level simulations. Results indicate that while the simple model is adequate for describing qualitative trends, it is not suitable for quantitative studies.
author2 Ronald Schrimpf
author_facet Ronald Schrimpf
Hooten, Nicholas C
author Hooten, Nicholas C
author_sort Hooten, Nicholas C
title Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes
title_short Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes
title_full Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes
title_fullStr Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes
title_full_unstemmed Characterization of the Two-Photon Absorption Carrier Generation Region in Silicon Diodes
title_sort characterization of the two-photon absorption carrier generation region in silicon diodes
publisher VANDERBILT
publishDate 2011
url http://etd.library.vanderbilt.edu/available/etd-07222011-143800/
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