Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies
Single event transients (SET) have become increasingly important to characterize since operating frequencies have surpassed 100 MHz. A common way to characterize SETs for a specific technology is to measure the range of SET pulse widths that are generated from the heavy-ion irradiation of a chain of...
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ndltd-VANDERBILT-oai-VANDERBILTETD-etd-05132014-0859012014-05-14T05:01:57Z Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies Maharrey, Jeffrey Alan Electrical Engineering Single event transients (SET) have become increasingly important to characterize since operating frequencies have surpassed 100 MHz. A common way to characterize SETs for a specific technology is to measure the range of SET pulse widths that are generated from the heavy-ion irradiation of a chain of inverters. Often, testing is performed on only a few varieties of inverters that are available within a single technology. This thesis focuses on how the choice of standard process design kit (PDK) parameters and layout techniques affect the range of pulse widths obtained from heavy-ion irradiation of inverter chains in 32nm and 45nm partially-depleted silicon-on-insulator technology. Inverters designed with varying threshold voltage, oxide thickness, drive strength and geometry were tested along with inverters with and without body contacts. SET pulse widths are fundamentally controlled by two factors, namely, the amount of charge collection and the charge dissipation rate. Pulse width data collected from this work suggests that the charge collection is dominated by bipolar amplification, and the charge dissipation rate is dominated by the restoring current of the unstruck transistor in the inverter. Thus, the effect that various design parameters have on the inverter SET response can be understood by knowing how each design variation affects either the bipolar amplification or the inverter drive strength. Lloyd W. Massengill W. Timothy Holman VANDERBILT 2014-05-13 text application/pdf http://etd.library.vanderbilt.edu/available/etd-05132014-085901/ http://etd.library.vanderbilt.edu/available/etd-05132014-085901/ en unrestricted I hereby certify that, if appropriate, I have obtained and attached hereto a written permission statement from the owner(s) of each third party copyrighted matter to be included in my thesis, dissertation, or project report, allowing distribution as specified below. I certify that the version I submitted is the same as that approved by my advisory committee. I hereby grant to Vanderbilt University or its agents the non-exclusive license to archive and make accessible, under the conditions specified below, my thesis, dissertation, or project report in whole or in part in all forms of media, now or hereafter known. I retain all other ownership rights to the copyright of the thesis, dissertation or project report. I also retain the right to use in future works (such as articles or books) all or part of this thesis, dissertation, or project report. |
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Electrical Engineering Maharrey, Jeffrey Alan Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies |
description |
Single event transients (SET) have become increasingly important to characterize since operating frequencies have surpassed 100 MHz. A common way to characterize SETs for a specific technology is to measure the range of SET pulse widths that are generated from the heavy-ion irradiation of a chain of inverters. Often, testing is performed on only a few varieties of inverters that are available within a single technology. This thesis focuses on how the choice of standard process design kit (PDK) parameters and layout techniques affect the range of pulse widths obtained from heavy-ion irradiation of inverter chains in 32nm and 45nm partially-depleted silicon-on-insulator technology. Inverters designed with varying threshold voltage, oxide thickness, drive strength and geometry were tested along with inverters with and without body contacts. SET pulse widths are fundamentally controlled by two factors, namely, the amount of charge collection and the charge dissipation rate. Pulse width data collected from this work suggests that the charge collection is dominated by bipolar amplification, and the charge dissipation rate is dominated by the restoring current of the unstruck transistor in the inverter. Thus, the effect that various design parameters have on the inverter SET response can be understood by knowing how each design variation affects either the bipolar amplification or the inverter drive strength. |
author2 |
Lloyd W. Massengill |
author_facet |
Lloyd W. Massengill Maharrey, Jeffrey Alan |
author |
Maharrey, Jeffrey Alan |
author_sort |
Maharrey, Jeffrey Alan |
title |
Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies |
title_short |
Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies |
title_full |
Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies |
title_fullStr |
Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies |
title_full_unstemmed |
Characterization of Heavy-Ion Induced Single Event Transients in 32nm and 45nm Silicon-on-Insulator Technologies |
title_sort |
characterization of heavy-ion induced single event transients in 32nm and 45nm silicon-on-insulator technologies |
publisher |
VANDERBILT |
publishDate |
2014 |
url |
http://etd.library.vanderbilt.edu/available/etd-05132014-085901/ |
work_keys_str_mv |
AT maharreyjeffreyalan characterizationofheavyioninducedsingleeventtransientsin32nmand45nmsilicononinsulatortechnologies |
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1716667135448580096 |