VLSI physical design automation for double patterning and emerging lithography
Due to aggressive scaling in semiconductor industry, the traditional optical lithography system is facing great challenges printing 32nm and below circuit layouts. Various promising nanolithography techniques have been developed as alternative solutions for patterning sub-32nm feature size. This dis...
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| Format: | Others |
| Language: | English |
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2011
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| Online Access: | http://hdl.handle.net/2152/ETD-UT-2010-12-2249 |