Enhancing the design-manufacturing interface in nanoscale technologies
Semiconductor scaling has been largely driven by advancements in lithographic technologies. However, the lack of a viable next generation lithography solution since the 180nm node has driven the industry to printing sub-wavelength features. This has led to rising manufacturing costs and diminishing...
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| Format: | Others |
| Language: | English |
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2010
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| Online Access: | http://hdl.handle.net/2152/ETD-UT-2010-05-1229 |