Organic materials development for advanced lithographic applications
The microelectronics industry strives for continued reduction in feature sizes to allow increased computing speed and power. This calls for continuous development of new materials. During the shift to 157 nm photolithography, it was discovered that fluorinated materials were necessary to provide s...
| Main Author: | |
|---|---|
| Format: | Others |
| Language: | English |
| Published: |
2010
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/2152/ETD-UT-2009-08-209 |