Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition

Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition

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Bibliographic Details
Main Author: Rathsack, Benjamen Michael
Format: Others
Language:English
Published: 2011
Subjects:
Masks (Electronics)
Image processing > Digital techniques
Lithography
Integrated circuits > Masks
Online Access:http://hdl.handle.net/2152/10808

Internet

http://hdl.handle.net/2152/10808

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