Consumable Process Development for Chemical Mechanical Planarization of Bit Patterned Media for Magnetic Storage Fabrication
As the superparamagnetic limit is reached, the magnetic storage industry looks to circumvent the barrier by implementing patterned media (PM) as a viable means to store and access data. Chemical mechanical polishing (CMP) is a semiconductor fabrication technique used to planarize surfaces and is inv...
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| Format: | Others |
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Scholar Commons
2010
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| Online Access: | http://scholarcommons.usf.edu/etd/3573 http://scholarcommons.usf.edu/cgi/viewcontent.cgi?article=4751&context=etd |