Metallic to insulating transition in disordered pulsed laser deposited silicide thin films
A metal-to-insulating transition has been observed in iron, iron oxide, iron silicide and cobalt silicide thin films when deposited on Si substrate with a native SiOx layer. This transition produced a change in resistance of 5 orders of magnitude at a temperature of 250 K. To the best of the author&...
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| Format: | Others |
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Scholar Commons
2005
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| Online Access: | http://scholarcommons.usf.edu/etd/2768 http://scholarcommons.usf.edu/cgi/viewcontent.cgi?article=3767&context=etd |