Carbide and MAX-Phase Engineering by Thin Film Synthesis

Carbide and MAX-Phase Engineering by Thin Film Synthesis

This thesis reports on the development of low-temperature processes for transition metal carbide and MAX-phase thin film growth. Magnetron sputtering and evaporation, far from thermodynamical equilibrium, have been utilised to engineer the properties of the films by physical and chemical control. De...

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Bibliographic Details
Main Author: Palmquist, Jens-Petter
Format: Doctoral Thesis
Language:English
Published: Uppsala universitet, Institutionen för materialkemi 2004
Subjects:
Inorganic chemistry
Thin films
microstructure
epitaxy
carbide
WC
MAX-phase
Ti3SiC2
DC magnetron sputtering
PVD
Reciprocal Space Mapping
RSM
Oorganisk kemi
Online Access:http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-3972
http://nbn-resolving.de/urn:isbn:91-554-5858-0

Internet

http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-3972
http://nbn-resolving.de/urn:isbn:91-554-5858-0

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