Employing Metal Iodides and Oxygen in ALD and CVD of Functional Metal Oxides
Many materials exhibit interesting and novel properties when prepared as thin films. Thin film metal oxides have had an impact on the technological progress of the microelectronics mainly due to their electrical and optical properties. Since the future goes towards the nanometre scale there is an in...
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| Format: | Doctoral Thesis |
| Language: | English |
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Uppsala universitet, Institutionen för materialkemi
2003
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-3450 http://nbn-resolving.de/urn:isbn:91-554-5660-X |