Deposition of Thin Film Electrolyte by Pulsed Laser Deposition (PLD) for micro-SOFC Development
Optimalization of PLD deposition of YSZ for micr-SOFC electrolyte applications by varying deposition pressure and target-substrate distance.Substrate used was Si-based chips and wafers (large area PLD), and the substrate temperature was held at 600. Dense films were obtained at 20 mTorr.
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| Format: | Others |
| Language: | English |
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Norges teknisk-naturvitenskapelige universitet, Institutt for materialteknologi
2012
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:no:ntnu:diva-19017 |