Combinatorial T hin F ilm Synthe sis of Cr2AlC; aComparison of Two Sputte ring M e tho ds

• Main Author: Carlsson, Peter
• Format: Others
• Language: English
• Published: Linköpings universitet, Tunnfilmsfysik 2012
• Online Access: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-77187

MAX phase materials have unique properties that combine metals and ceramics.These properties stems from the complex structure with extremely strong M-Xbonds and weaker M-A bonds. Physical vapor deposition in form of magnetronsputtering is widely used for thin film syntheses. High Power Impulse MagnetronSputtering (HIPIMS) was introduced in the mid-90s, today it is a state of the artthin film deposition method for researchers all over the world.Combinatorial sputter deposition of Cr2AlC with HIPIMS and direct currentmagnetron sputtering of the chromium target were compared. Aluminum andcarbon were sputtered from individual targets with a shield in between of thethree targets, making the combinatorial method possible.X-ray diffraction showed that Cr2AlC was present at 550oC and scanning elec-tron microscopy showed that there was not big difference in the morphology. Elec-trical measurements indicated that the film deposited with HIPIMS had a signif-icant higher electrical conductivity compared to the film deposited with directcurrent. x-ray photoelectron Spectroscopy gives an idea of the composition of thefilm, in one position there were oxygen through the film, the rest were dense films.By using a combinatorial approach Cr2Al was also found in the films. The twofilms compared deposited with different methods, showed small differences but notthe ones expected.