Framställning av multilagerfilmen AlN-HQ
The method Atomic Layer Deposition, ALD, has been available since the 1970´s and it has opened the possibility to fabricate methods for inorganic thin films on a nanoscale. Later the interest for fabricating organic thin films with Molecular Layer Deposition, MLD, and controlling both the thickness...
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| Format: | Others |
| Language: | Swedish |
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Linköpings universitet, Institutionen för fysik, kemi och biologi
2021
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-176218 |