Nanocrystalline Alumina-Zirconia Thin Films Grown by Magnetron Sputtering
Alumina-zirconia thin films have been deposited using dual magnetron sputtering. Film growth was performed at relatively low-to-medium temperatures, ranging from ~300°C to 810 °C. Different substrates were applied, including silicon (100), and industrially relevant materials, such as WC-Co hardmetal...
| Main Author: | |
|---|---|
| Format: | Doctoral Thesis |
| Language: | English |
| Published: |
Linköpings universitet, Tunnfilmsfysik
2008
|
| Subjects: | |
| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17529 http://nbn-resolving.de/urn:isbn:978-91-85895-18-2 |