Silicon Oxynitride Thin Films Grown by Reactive HiPIMS
Amorphous silicon oxynitride (SiOxNy) thin films were grown by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O plasmas. The elemental composition of the films was shown to depend on the target surface conditions during the film deposition, as well as on the reac...
| Main Author: | |
|---|---|
| Format: | Others |
| Language: | English |
| Published: |
Linköpings universitet, Tunnfilmsfysik
2015
|
| Subjects: | |
| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-123383 http://nbn-resolving.de/urn:isbn:978-91-7685-879-0 |