An investigation into Plasma Vapor Deposition Aided Chemical Vapor Deposition : A PVD aided CVD process for depositing Nitrogenatoms mixed in Carbon Diamond-Like-Structure is investigated and one such layer is formed with this method
The work presented in this master thesis includes experiments and analysis of the Physical Vapor Deposition aided Chemical Vapor deposition. Physical Vapor Deposition is usually deemed as a process of applying plasma phenomenon in highvacuum situation, knocking off the cathode material like particle...
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| Format: | Others |
| Language: | English |
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KTH, Industriell produktion
2010
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-50056 |