Novel concepts for advanced CMOS : Materials, process and device architecture
The continuous and aggressive dimensional miniaturization ofthe conventional complementary-metal-oxide semiconductor (CMOS)architecture has been the main impetus for the vast growth ofIC industry over the past decades. As the CMOS downscalingapproaches the fundamental limits, unconventional material...
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| Format: | Doctoral Thesis |
| Language: | English |
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KTH, Mikroelektronik och informationsteknik, IMIT
2004
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3805 |