Investigating and Fabricating High-K (Al2O3) and Ferroelectric (HfO2) MIM-Capacitors for use in BEOL Fabrication Applications

Integration of high-K Metal-Insulator-Metal (MIM) capacitors in the Back-end-of-line (BEOL) is a topic of interest for the further development of the process at KTH Royal Institute of Technology. MIM-capacitors benefit from having constant capacitance values over a range of voltages and/or frequenci...

Full description

Bibliographic Details
Main Author: Hackett, Thomas
Format: Others
Language:English
Published: KTH, Skolan för elektroteknik och datavetenskap (EECS) 2021
Subjects:
Online Access:http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-304374