Top-down Fabrication Technologies for High Quality III-V Nanostructures

Top-down Fabrication Technologies for High Quality III-V Nanostructures

III-V nanostructures have attracted substantial research effort due to their interesting physical properties and their applications in new generation of ultrafast and high efficiency nanoscale electronic and photonic components. The advances in nanofabrication methods including growth/synthesis have...

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Bibliographic Details
Main Author: Naureen, Shagufta
Format: Doctoral Thesis
Language:English
Published: KTH, Halvledarmaterial, HMA 2013
Subjects:
III-V nanostructures
colloidal lithography
top-down fabrication
dry etching
quantum well
multilayer structures
nanowires
nanopillars
nanodisks
mono-layer etching
surface passivation
photoluminescence
carrier life time
total reflectivity
photonic crystals
nanomesh
Online Access:http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-117766
http://nbn-resolving.de/urn:isbn:978-91-7501-633-7

Internet

http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-117766
http://nbn-resolving.de/urn:isbn:978-91-7501-633-7

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