Gpu Based Lithography Simulation and Opc
Optical Proximity Correction (OPC) is a part of a family of techniques called Resolution Enhancement Techniques (RET). These techniques are employed to increase the resolution of a lithography system and improve the quality of the printed pattern. The fidelity of the pattern is degraded due to the d...
| Main Author: | |
|---|---|
| Format: | Others |
| Published: |
ScholarWorks@UMass Amherst
2011
|
| Subjects: | |
| Online Access: | https://scholarworks.umass.edu/theses/721 https://scholarworks.umass.edu/cgi/viewcontent.cgi?article=1804&context=theses |