Automatic Techniques for Modeling Impact of Sub-wavelength Lithography on Transistors and Interconnects and Strategies for Testing Lithography Induced Defects

For the past four decades, Moore's law has been the most important benchmark in microelectronic circuits. Continuous improvement in lithographic technology has key enabler for growth in transistor density. In recent times, the wavelength of the light source has not kept its pace in scaling. Con...

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Bibliographic Details
Main Author: Sreedhar, Aswin
Format: Others
Published: ScholarWorks@UMass Amherst 2008
Subjects:
Online Access:https://scholarworks.umass.edu/theses/80
https://scholarworks.umass.edu/cgi/viewcontent.cgi?article=1119&context=theses

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