Automatic Techniques for Modeling Impact of Sub-wavelength Lithography on Transistors and Interconnects and Strategies for Testing Lithography Induced Defects
For the past four decades, Moore's law has been the most important benchmark in microelectronic circuits. Continuous improvement in lithographic technology has key enabler for growth in transistor density. In recent times, the wavelength of the light source has not kept its pace in scaling. Con...
| Main Author: | |
|---|---|
| Format: | Others |
| Published: |
ScholarWorks@UMass Amherst
2008
|
| Subjects: | |
| Online Access: | https://scholarworks.umass.edu/theses/80 https://scholarworks.umass.edu/cgi/viewcontent.cgi?article=1119&context=theses |