Process design for yield in deep submicron devices
Interaction between the manufacturing process and the circuit has become a major source of the yield loss in nanometer nodes of the current day semiconductor manufacturing. In this thesis author attempts to formalize a framework for both designers and process engineers to solve process and design in...
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| Language: | ENG |
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ScholarWorks@UMass Amherst
2008
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| Online Access: | https://scholarworks.umass.edu/dissertations/AAI3315495 |