Characterization of photonic crystal silicon-on-insulator optical circuits fabricated by a CMOS foundry
Prototype silicon photonic circuits in a silicon-on-insulator (SOI) wafer fabricated using a CMOS-based single layer process, are thoroughly characterized. Thousands of devices were fabricated on a single 200 mm diameter wafer using deep UV lithography at the IMEC silicon photonics foundry. The devi...
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| Language: | English |
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University of British Columbia
2011
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| Online Access: | http://hdl.handle.net/2429/38167 |