| Summary: | Automatic layout generation techniques can be used to generate layouts in arbitrary technologies if sufficient information describing the technology is available, and if sufficient constraints can be applied to device placement and routing. Two approaches can be taken to the automatic generation of layouts: the coordinate-free, or relative coordinate approach, and the origin-based, or absolute coordinate approach. Each of these methods was used to implement design-rule independent layout generators, the coordinate-free method on a PLA generator, and the origin-based method on a gate matrix generator. It was determined that the origin-based approach was more suitable to mask-level layout generation than was the coordinate-free system. === Applied Science, Faculty of === Electrical and Computer Engineering, Department of === Graduate
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