Sputtering and characterizations of titanium oxide films
Reactive magnetron sputtering of titanium oxides has been investigated with emphasis on the technique of using a reactive gas baffle to enhance film oxidation. This method consists of placing a partial barrier between the sputtering target and the substrate. For the first time the dependence of the...
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| Language: | English |
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University of British Columbia
2010
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| Online Access: | http://hdl.handle.net/2429/25850 |