Thin oxide films: mechanisms of growth, dielectric and optical properties and applications in semiconductor devices
Dielectric films are important in the fabrication of semiconductor devices. Thermally grown and CVD SiO₂, and CVD silicon nitride films are perhaps the most widely used dielectric materials at present. Future developments in both Si and GaAs technology, however, would seem to require the introductio...
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| Language: | English |
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2010
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| Online Access: | http://hdl.handle.net/2429/23176 |