Study on the Control of Inner Relative Humidity in the FOUP under Open Door Condition by using the Baffle which is applied to the Laminar Air Curtain with Diffuser Purge

碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系 === 107 === In the past two decades, Taiwan's semiconductor industry has flourished. The process line width is from 90nm a decade ago to the latest 7nm, and the planned 5nm and 3nm in the future. As the line width shrinks and the complexity of the process increase...

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Bibliographic Details
Main Authors: LI, XUE-HAN, 李學涵
Other Authors: HU, SHIH-CHENG
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/s95nb8