Flow Field Visualization of a FOUP Under Different EFEM Arrangements During Open Door Condition

碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系 === 107 === As the gate length of integrated circuits shrinks, the yield of semiconductor processes is challenged, and contamination-free manufacturing has become the most critical factor in semiconductor high-tech processes, especially integrated circuit manufacturing...

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Bibliographic Details
Main Authors: LEE, TZU-CHIEH, 李子傑
Other Authors: HU, SHIH-CHENG
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/f77m99