Effect of Oxide Thickness on The Two-State haracteristics in MIS(p) Tunnel Diode with Ultra-thin Metal Surrounded Gate
碩士 === 國立臺灣大學 === 電子工程學研究所 === 107 === In this thesis, ultrathin metal surrounded gate Metal-Insulator-Semiconductor (UTMSG MIS) tunnel diodes with various oxide thicknesses were fabricated. The transient two-state characteristics of targeting devices can be magnified. In chapter 2, the electrical c...
Main Authors: | Chieh-Fang Cheng, 鄭捷方 |
---|---|
Other Authors: | Jenn-Gwo Hwu |
Format: | Others |
Language: | en_US |
Published: |
2019
|
Online Access: | http://ndltd.ncl.edu.tw/handle/upbe79 |
Similar Items
-
Two-State Current Behavior in MIS Tunnel Diode with Ultra-thin Surrounding Gate Metal Electrode
by: Kuan-Hao Tseng, et al.
Published: (2016) -
Study of MIS(p) Tunneling Diode Structures with Surrounding MIS(P) Gate
by: Hung-Yu Chen, et al.
Published: (2018) -
Effect of Sidewall Passivated Metal Gate on Fringing Field of MIS Tunnel Diode and Its Application
by: Chia-Ju Chou, et al.
Published: (2017) -
ZnON MIS Thin-Film Diodes
by: Mohamad Hazwan Mohd Daut, et al.
Published: (2019-01-01) -
Study of Metal Gate on Ultra-thin Gate Dielectrics Integrity
by: Shi-Ming Chiang, et al.
Published: (2000)