Effect of Different Oxygen Flow and Bilayer Gate Insulator on Electrical Performance and Bias Stability of a-IGZO TFTs

碩士 === 國立臺南大學 === 電機工程學系碩博士班 === 107 === The amorphous indium gallium zinc oxide (IGZO) semiconductor has better uniformity due to the amorphous structure. Compared to the traditional using of amorphous silicon, IGZO has the higher mobility, low fabrication temperature, low fabrication cost. However...

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Bibliographic Details
Main Authors: LIN, TSUNG-SHENG, 林宗聖
Other Authors: SHEI, SHIN-CHANG
Format: Others
Language:en_US
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/ymvu9y