Plasma-Enhanced Atomic Layer Deposition and Simulation by CFD using H2/Ar Plasma - Effect of Tailored Voltage Waveforms
碩士 === 國立清華大學 === 工程與系統科學系 === 107 === Plasma plays an important role in semiconductor manufacturing process nowadays. As semiconductor component size getting smaller and smaller, it was currently widely used in some critical processes. PEALD, which can deposit thin film at the atomic level with hig...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/72y4pm |