N/F Incorporated High-k Gate Dielectric and SiGe Buried Channel on Electrical Characteristics of FinFET

碩士 === 國立清華大學 === 工程與系統科學系 === 107

Bibliographic Details
Main Authors: Tsai, Shang-Fu, 蔡尚甫
Other Authors: ChangLiao, Kuei-Shu
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/e26jte