Fabrication of Gallium Nitride Thin Films By Using the Reactive DC Pulse Magnetron Sputtering
碩士 === 國立中央大學 === 照明與顯示科技研究所 === 107 === Currently, gallium nitride thin films were mainly grown by metal organic chemical vapor deposition (MOCVD) or molecular beam epitaxy (MBE), with the disadvantages of high process temperature and high cost. In this research the sputterring method , was applie...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/afs8mk |