Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers

碩士 === 國立中央大學 === 光電科學與工程學系 === 107 === In this thesis, we use AlGaAs epitaxial wafer to fabricate 10GHz 850nm Vertical Cavity Surface Emitting Laser and increase modulation bandwidth by reducing parasitic capacitance. Reducing parasitic capacitance by isolation and two kind of passivation layers....

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Main Authors: Guo-Jhang Wu, 吳國彰
Other Authors: Jenq-Yang Chang
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/45pb57
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spelling ndltd-TW-107NCU056140022019-06-01T03:42:08Z http://ndltd.ncl.edu.tw/handle/45pb57 Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers 850nm垂直共振腔面射型雷射之鈍化層改善及光電特性分析 Guo-Jhang Wu 吳國彰 碩士 國立中央大學 光電科學與工程學系 107 In this thesis, we use AlGaAs epitaxial wafer to fabricate 10GHz 850nm Vertical Cavity Surface Emitting Laser and increase modulation bandwidth by reducing parasitic capacitance. Reducing parasitic capacitance by isolation and two kind of passivation layers. The passivation layer is Benzocyclobutene (BCB) and Multilayer. First of all, Isolation reduces capacitance value in the same passivation layer. The capacitance value is reduced from 0.116 pF (W/O Isolation) to 0.069 pF (W/Isolation) in the BCB. The capacitance value is reduced from 0.145 pF (W/O Isolation) to 0.121 pF (W/Isolation) in the Multilayer×2. On the other hand, the passivation layer reduce capacitance value in the W/ Isolation. The capacitance value is reduced from 0.161 pF (Multilayer×1) to 0.121 pF (Multilayer×2) in the W/ Isolation. The capacitance value is reduced from 0.121 pF (Multilayer×2) to 0.069 pF (BCB) in the W/ Isolation. In the W/ Isolation, the modulation bandwidth is increase from 9.6 GHz (Multilayer×2) to 9.9 GHz (BCB). Although the Multilayer×2 and BCB has the similar threshold condition and modulation bandwidth, the advantages of the Multilayer×2 are good metal adhesion, simple process flow and low cost. Since the Multilayer×2 has similar element characteristics to BCB and improves the disadvantage of BCB, a thick composite film can replace BCB as a better passivation layer material. Jenq-Yang Chang 張正陽 2018 學位論文 ; thesis 64 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立中央大學 === 光電科學與工程學系 === 107 === In this thesis, we use AlGaAs epitaxial wafer to fabricate 10GHz 850nm Vertical Cavity Surface Emitting Laser and increase modulation bandwidth by reducing parasitic capacitance. Reducing parasitic capacitance by isolation and two kind of passivation layers. The passivation layer is Benzocyclobutene (BCB) and Multilayer. First of all, Isolation reduces capacitance value in the same passivation layer. The capacitance value is reduced from 0.116 pF (W/O Isolation) to 0.069 pF (W/Isolation) in the BCB. The capacitance value is reduced from 0.145 pF (W/O Isolation) to 0.121 pF (W/Isolation) in the Multilayer×2. On the other hand, the passivation layer reduce capacitance value in the W/ Isolation. The capacitance value is reduced from 0.161 pF (Multilayer×1) to 0.121 pF (Multilayer×2) in the W/ Isolation. The capacitance value is reduced from 0.121 pF (Multilayer×2) to 0.069 pF (BCB) in the W/ Isolation. In the W/ Isolation, the modulation bandwidth is increase from 9.6 GHz (Multilayer×2) to 9.9 GHz (BCB). Although the Multilayer×2 and BCB has the similar threshold condition and modulation bandwidth, the advantages of the Multilayer×2 are good metal adhesion, simple process flow and low cost. Since the Multilayer×2 has similar element characteristics to BCB and improves the disadvantage of BCB, a thick composite film can replace BCB as a better passivation layer material.
author2 Jenq-Yang Chang
author_facet Jenq-Yang Chang
Guo-Jhang Wu
吳國彰
author Guo-Jhang Wu
吳國彰
spellingShingle Guo-Jhang Wu
吳國彰
Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers
author_sort Guo-Jhang Wu
title Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers
title_short Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers
title_full Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers
title_fullStr Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers
title_full_unstemmed Improvement of passivation layer and Characterization of 850 nm Vertically cavity surface-emitting lasers
title_sort improvement of passivation layer and characterization of 850 nm vertically cavity surface-emitting lasers
publishDate 2018
url http://ndltd.ncl.edu.tw/handle/45pb57
work_keys_str_mv AT guojhangwu improvementofpassivationlayerandcharacterizationof850nmverticallycavitysurfaceemittinglasers
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AT wúguózhāng 850nmchuízhígòngzhènqiāngmiànshèxíngléishèzhīdùnhuàcénggǎishànjíguāngdiàntèxìngfēnxī
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