Nucleation and growth dynamics of graphene grown through plasma enhanced chemical vapor deposition (PECVD)
碩士 === 國立中央大學 === 物理學系 === 107 === As the one of the promising method for graphene growth, chemical vapor deposition (CVD) features the low cost, wafer-scaled graphene layer production. However, the temperature for graphene growth is about 1050℃ which has the problem of energy consumption. The devel...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/p5j22g |