The Study of Flow Field Investigation and Visualization of Plasma Jet
碩士 === 國立交通大學 === 機械工程系所 === 107 === In modern epitaxial process, film quality heavily depends on the uniformity of the flow field. In our study, flow distribution was visualized using the Atmospheric Pressure Plasma Jet(APPJ). The investigated parameters included applied voltage (4 - 8 kV), reactio...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/d9e6v3 |
| Summary: | 碩士 === 國立交通大學 === 機械工程系所 === 107 === In modern epitaxial process, film quality heavily depends on the uniformity of the flow field. In our study, flow distribution was visualized using the Atmospheric Pressure Plasma Jet(APPJ). The investigated parameters included applied voltage (4 - 8 kV), reaction gas (argon 15 SLM) and TiO2 seeding gas. (1-10 SLM) The flow was from the premixed system and transported into the chamber through a 7 mm diameter cone quartz tube. With applying high voltage and high flow rate of argon-air mixture, particles in the flow field were illuminated by the plasma jet. The illumination image was dependent on the plasma jet length and captured by high speed camera. The flow field were observed and measured by a 2-D Particle Image Velocimetry system (PIV). Our results showed that the length of the impingement was related to the chamber illumination. Without sufficient illumination, the flow field captured by the high speed camera were visible near the plasma jet or the volumetric illumination of the chamber flow.
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