Properties and Reliability Investigation in Tellurium-Based Conductive Bridge Random Access Memory

博士 === 國立交通大學 === 電子研究所 === 107 === The CBRAM devices with Tellurium as ion source are investigated in this thesis, which are categorized into three parts. In the first part, oxygen-free SiN is used as resistive layer, which prevents oxygen vacancies from being the composition of conductive filament...

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Bibliographic Details
Main Authors: Lin, Chun-An, 林俊安
Other Authors: Tseng, Tseung-Yuan
Format: Others
Language:en_US
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/977at2