Investigation on Ferroelectric Characterization of Hafnium-Oxide-Based Ferroelectric Memories with Remote Plasma Treatments
碩士 === 國立交通大學 === 照明與能源光電研究所 === 107
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/57u78k |