Comparison of Various Low-k Materials
碩士 === 國立暨南國際大學 === 電機工程學系 === 107 === This thesis consists of three parts. The first part focuses on the physical and electrical characteristics, as well as the reliability, of various commercial low-k dielectric films with k values from 2.50 to 3.60, deposited by plasma-enhanced chemical vapor dep...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/zx4a3p |