A TCAD Simulation Study for Transistor with Ferroelectric Material

碩士 === 國立中興大學 === 電機工程學系所 === 107 === Nowadays, iron materials are applied to transistors in two aspects of, first, a transistor with a negative capacitance effect that improves the voltage amplification effect, and secondly, a ferroelectric memory applied to memory units. This thesis focuses on the...

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Bibliographic Details
Main Authors: Yun-Fang Chung, 鍾昀芳
Other Authors: Shu-Tong Chang
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/cgi-bin/gs32/gsweb.cgi/login?o=dnclcdr&s=id=%22107NCHU5441076%22.&searchmode=basic