Effects of capping layers on microstructural and magnetic properties of MnBi alloy thin films

碩士 === 國立中興大學 === 材料科學與工程學系所 === 107 === The thin films of two systems, Ta(10 min, around 9 nm)/ MnBi(20 min, around 50 nm)/ Si wafer系統與SiO2(10 min, around 25 nm)/ MnBi(20 min, around 50 nm)/ Si wafer, were prepared by the ion beam assisted deposition system (IBAD). After preparing the samples, the...

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Bibliographic Details
Main Authors: Pei-Jyun Lai, 賴佩君
Other Authors: Ko-Wei Lin
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/cgi-bin/gs32/gsweb.cgi/login?o=dnclcdr&s=id=%22107NCHU5159025%22.&searchmode=basic