| Summary: | 碩士 === 崑山科技大學 === 電機工程研究所 === 107 === In the study, the titanium dioxide (TiO2) stack was applied to the borosilicate glass test piece by the ion sputtering principle of the RF sputtering machine. Films were formed and three different thicknesses of titanium dioxide (TiO2) slides were prepared, which were 5, 15, and 50 (nm), respectively. In the process of various processes, hydrogen and nitrogen (100 sccm / 600w) were used to continuously erode the surface of the sample under vacuum and then annealed to prepare a good sample. This is a photocatalytic titanium dioxide film. After completing the sample, we used an atomic force microscope, a contact angle meter, and an ultraviolet/visible spectrometer.
Experimental analysis found that. Hydrogen-nitrogen plasma annealing, the roughness is optimal at 50 (nm) film thickness, and 1.15 Ra (nm) represents the more complete structure. The contact angle is optimal at a film thickness of 5 (nm), and 22.43 degrees represents better hydrophilicity. In the 5 (nm) film thickness state, the transmittance and reflectance are optimal, and 96.5% and 10.32% respectively represent better transmittance. According to the experimental data analysis, hydrogen-nitrogen plasma annealing is more suitable for self-cleaning glass in the film thickness of 5 (nm).
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