Chemical Combination of Graphene/Polyurethane Slurry for Advanced Chemical Mechanical Polishing of Single Crystalline SiC Wafers
碩士 === 逢甲大學 === 機械與電腦輔助工程學系 === 107 === The chemical combination of graphene / polyurethane slurry prepared in this paper is a modification of polyurethane (PU) microspheres and graphene oxide (GO), that is, the NCO end of PU functional group-OH terminal of GO are bonded to form a chemically grafted...
Main Authors: | HSIEH,PING-CHUN, 謝秉均 |
---|---|
Other Authors: | LIU,HSIEN-KUANG |
Format: | Others |
Language: | zh-TW |
Published: |
2019
|
Online Access: | http://ndltd.ncl.edu.tw/handle/39qc9e |
Similar Items
-
Research on Compound Graphene/Polyurethane Slurry for Advanced Chemical Mechanical Polishing of single Crystalline SiC wafers
by: CHEN, CHUN-JEN, et al.
Published: (2018) -
Analysis on Compound Slurry with Graphene Oxide for Chemical Mechanical Polishing of Single Crystalline Silicon Carbide Wafer
by: Yu-Jing Lin, et al.
Published: (2019) -
Study on Graphene Oxide Hybrid Slurry in Chemical Mechanical Polishing of Monocrystalline Silicon Carbide Wafer
by: Yu-Cheng Huang, et al.
Published: (2017) -
The Influence of Addition of Graphene in Slurry on Chemical Mechanical Lapping of Sapphire Wafer
by: 陳韋仲
Published: (2016) -
Heteroepitaxial Growth of SiC and Ge on Si Wafers by Chemical Vapor Deposition
by: Chie-Sheng Liu, et al.
Published: (2008)