Glancing Angle Deposition of Titanium Nitride Nanorod Array: Surface Morphology and Optical Properties Analysis

• Main Authors: Kai-Lun Wu, 吳凱倫
• Other Authors: 任貽均
• Format: Others
• Language: zh-TW
• Published: 2018
• Online Access: http://ndltd.ncl.edu.tw/handle/7vc3zt

碩士 === 國立臺北科技大學 === 光電工程系 === 106 === In this work, we used DC magnetron sputtering and glancing angle deposition (GLAD) to deposit titanium nitride (TiN) nanorod array on silicon wafer, glass substrate (BK7) and sapphire substrate. The surface morphology of the nanostructures was explored by changing the process parameters such as the deposition angle, post-deposition annealing, and ratio of argon-nitrogen. The morphology and the lattice orientation (111) and (200) were analyzed by SEM and X-ray diffraction (XRD), respectively. In addition, X-ray photoelectron spectroscopy (XPS) confirms its chemical analysis. The equivalent optical constants were measured by using ellipsometer. The relationship between optical constants and lattice composition was discussed and analyzed. In the experimental results, the columnar angle of the nanorods becomes larger and the column diameter becomes smaller because the proportion of nitrogen increases in the nanostructure. However, the crystallite size and the amount of nitrogen are proportional and the proportion of nitrogen increases the lattice orientation which will grow along the (200) orientation. The larger crystallite increases the porosity of the film that cause the high resistance. Thus, the porosity of the film resulting in the increase of transmission and decrease of reflection.