Study of Pad Metal Void Improvement in Copper Wire Bond Process
碩士 === 國立高雄大學 === 電機工程學系-電子構裝整合技術產業碩士專班 === 106 === For developing compact electronic products, circuit under pad structure was developed in wafer level, in the high hardness copper (Cu) wire bonding process, this structure may suffer the impact and cause yield loss. This thesis is focused on the st...
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ndltd-TW-106NUK014420162019-05-16T00:37:22Z http://ndltd.ncl.edu.tw/handle/fyhb7y Study of Pad Metal Void Improvement in Copper Wire Bond Process 銅線製程對鋁墊缺鋁改善參數研究 Jui-hung Hung 洪睿紘 碩士 國立高雄大學 電機工程學系-電子構裝整合技術產業碩士專班 106 For developing compact electronic products, circuit under pad structure was developed in wafer level, in the high hardness copper (Cu) wire bonding process, this structure may suffer the impact and cause yield loss. This thesis is focused on the study of the process window in copper wire bonding process with different characteristic metal void element. Process parameters designed by JMP methods were applied in this study. With the analysis, optimized process parameters can be achieved. The final working verification was applied to study the yield improvement. Ming Chang Shih 施明昌 2018 學位論文 ; thesis 55 zh-TW |
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碩士 === 國立高雄大學 === 電機工程學系-電子構裝整合技術產業碩士專班 === 106 === For developing compact electronic products, circuit under pad structure was developed in wafer level, in the high hardness copper (Cu) wire bonding process, this structure may suffer the impact and cause yield loss. This thesis is focused on the study of the process window in copper wire bonding process with different characteristic metal void element. Process parameters designed by JMP methods were applied in this study. With the analysis, optimized process parameters can be achieved. The final working verification was applied to study the yield improvement.
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author2 |
Ming Chang Shih |
author_facet |
Ming Chang Shih Jui-hung Hung 洪睿紘 |
author |
Jui-hung Hung 洪睿紘 |
spellingShingle |
Jui-hung Hung 洪睿紘 Study of Pad Metal Void Improvement in Copper Wire Bond Process |
author_sort |
Jui-hung Hung |
title |
Study of Pad Metal Void Improvement in Copper Wire Bond Process |
title_short |
Study of Pad Metal Void Improvement in Copper Wire Bond Process |
title_full |
Study of Pad Metal Void Improvement in Copper Wire Bond Process |
title_fullStr |
Study of Pad Metal Void Improvement in Copper Wire Bond Process |
title_full_unstemmed |
Study of Pad Metal Void Improvement in Copper Wire Bond Process |
title_sort |
study of pad metal void improvement in copper wire bond process |
publishDate |
2018 |
url |
http://ndltd.ncl.edu.tw/handle/fyhb7y |
work_keys_str_mv |
AT juihunghung studyofpadmetalvoidimprovementincopperwirebondprocess AT hóngruìhóng studyofpadmetalvoidimprovementincopperwirebondprocess AT juihunghung tóngxiànzhìchéngduìlǚdiànquēlǚgǎishàncānshùyánjiū AT hóngruìhóng tóngxiànzhìchéngduìlǚdiànquēlǚgǎishàncānshùyánjiū |
_version_ |
1719168754218172416 |