Study of Pad Metal Void Improvement in Copper Wire Bond Process

碩士 === 國立高雄大學 === 電機工程學系-電子構裝整合技術產業碩士專班 === 106 === For developing compact electronic products, circuit under pad structure was developed in wafer level, in the high hardness copper (Cu) wire bonding process, this structure may suffer the impact and cause yield loss. This thesis is focused on the st...

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Bibliographic Details
Main Authors: Jui-hung Hung, 洪睿紘
Other Authors: Ming Chang Shih
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/fyhb7y