Short-Time and Low-Temperature Development for Electron-Beam Lithography and the Algorithms of Proximity Effect Correction
博士 === 國立臺灣大學 === 電子工程學研究所 === 106 === Electron-beam lithography (EBL) is one of the most popular and important techniques in manufacturing high-resolution nanopatterns without masks and enabling the fast development of electronic and photonic devices. The proximity effect is one of the most critica...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/e66nvt |